CTI Cryogenics Vacuum Pumps, Granville-Phillips vacuum gauging & instrumentation. Polycold Closed Loop Gas Chillers for cryo-pumping large volume gas loads.

An industry leader in the design and manufacture of a complete line of 304ss vacuum flanges, fittings, valves as well as custom vacuum chambers and custom assemblies and manifolds. A&N is also a provider of a complete line of heating jackets and temperature controllers for processes requiring heated vacuum lines to prevent process build up.

Vari-Q Process Vacuum Throttling Valves and Controllers for complete vacuum process pressure control requirements.

Manufacturer of ION Pumps and Digitel Controllers for UHV vacuum pumping requirements.

Residual Gas Analyzers for measuring partial pressures in a vacuum process system. DYMAXION Smart Sensor technology. Zero Footprint with on-board electronics. Self diagnostics with Windows XP 32-bit fully threaded technology. 100-300 AMU. Open and closed Source designs for wide process pressure operating windows.

Manufacturer and Design of Fully Automated, Semi-Automated and Manual Wet Processing stations for etch, surface preparation,  passivation and surface clean applications. Multi-position Rotary Robot layout and Linear designs available.

Designer of the original "Kaufman" style ion source the company provides a complete line of gridless style of sources and also gridded ion sources to address a wide array of process applications. Sources are typically used for process enhancement in deposition, milling and surface preparation for many types of substrate materials.

US, Inc. has been an industry standard for providing their highly reliable RF and DC sputtering sources. Sources are designed either for new systems or for retro-fitting an existing deposition system for process enhancements or system upgrades.

Cryogenic Research systems for low temperature studies from 1.7K to 800 Kelvin temperature ranges. Open and Closed Cycle systems for varied laboratory applications. Full line of Optical windows, standard and custom sample mounting stages for Low Heat Load applications, X-ray Diffraction, Neutron Scattering, Non-optical studies including numerous additional research applications.

Supplier of a full line of clean room products such as gowns, booties, gloves, tacky mats, wipes, stationary and many other clean room products.

An industry leader in providing portable and modular clean rooms for temporary use or permanent applications. Clean rooms can be provided based on the particle classification that is required. Rooms can be provided with a complete installation of fan-powered hepa filters, change rooms and internal lighting.

VERSALINE modular platform for R&D and production systems for RIE, PECVD, DRIE and ICP plasma processing. Fully automated C2C, Load-locked process systems. VERSALINE allows for additional process modules to be added onto existing system in the field for increased process capabilities. MASK Etcher for advanced ICP etching of photo masks. LAPECVD for high throughput Large Area PECVD requirements. System 790 and 790+ industry standards for manual and load-locked single wafer and batch etching processes for RIE and PECVD applications.

Complete line of Horizontal and Verticle Multi-Zone diffusion process furnaces for Semiconductor and Solar PV device fabrication. Complete automated PC controlled processing for material annealing and oxidation and diffusion processing of various substrate materials. Replacement elements for all furnace systems. New designs for high throughput and uniformity for Solar PV market with low cost of ownership.       

4WAVE-

 Design and manufacturer of R&D and production
Cluster tools for Ion Beam Deposition for highly uniform nano-layers and Ion Milling applications. Proven process applications include: Dielectric films, Carbon & DLC, metals and magnetic materials, specialty materials, ITO, YBCO, Optical interference stacks, Spin Valves, MEMS, etc. Full line of opto-electronic filters and wave guide devices. LIBE, LISE and LIME Ion Beam Etch systems and 4W-LANS alloy and nano-layer sputter deposition systems. Biased Target Deposition provided for highly flexible deposition requirements. Custom thin film services provided at 4WAVE laboratory. Full Metrology lab services available to assist in customer process development.